Advanced nanolithography for particle tracking published in Advanced Functional Materials

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The article describes the combination of advanced nanolithographic processes and piezoelectric materials on wafer scale. The methods are based on phase shift lithography (PSL) and atomic layer deposition based spacer lithography (ASL). Extremely high spatial resolution force position arrays which are able to track the position of micro- or nanometer sized objects are achieved by these methods.

K. Subannajui, A. Menzel, F. Güder, Y. Yang, K. Schumann, X. Lu, M. Zacharias, Adv. Funct. Mater. 2013, 23, 191-197.

DOI: 10.1002/adfm.201370009

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